Electron attachment to atomic hydrogen on the surface of liquid 4He

Электроны над жидким гелием


  • Toshikazu Arai Research Center for Low Temperature and Materials Sciences, Kyoto University, Kitashirakawa-Oiwake-cho, Sakyo-ku, Kyoto, 606-8502, Japan
  • Hideki Yayama Department of Physics, Kyushu University, 4-2-1 Ropponmatsu, Chuo-ku, Fukuoka, 810-8560, Japan
  • Kimitoshi Kono RIKEN, Low Temperature Physics Laboratory, Hirosawa 2-1, Wako-shi, Saitama, 351-0198, Japan



Ключові слова:

surface state electrons, atomic hydrogen, electron attachment.


We demonstrate a possibility that helium surface electrons at cryogenic temperatures can be used as a new source of very low energy electrons. Since both electrons (e-) and hydrogen atoms (H) are bound on liquid helium surface, two-dimensional mixture gas of these two species is available on the surface. We found that low energy collision of e- and H drives electron attachment to form a negative hydrogen ion (H-) in the mixture. From our temperature dependence measurement of the reaction rate, it was found that another H atom participate in the reaction. Namely, the reaction is expressed as H + H + e- + H- + H. Possible reaction mechanisms are discussed in terms of direct three-body process and dissociative attachment process. Measurements in applied magnetic field (B) show that the reaction rate coefficient is suppressed as ~ B-2. This implies that electron spin singlet collision is relevant for electron attachment.


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Як цитувати

Arai, T.; Yayama, H.; Kono, K. Electron Attachment to Atomic Hydrogen on the Surface of Liquid 4He: Электроны над жидким гелием. Fiz. Nyzk. Temp. 2008, 34, 496-503.




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