Equilibrium helium film in the thick film limit

Physics in Quantum Crystals

Автор(и)

  • J. Klier Department of Physics, University of Konstanz, Konstanz D-78457, Germany
  • F. Schletterer Department of Physics, University of Konstanz, Konstanz D-78457, Germany
  • P. Leiderer Department of Physics, University of Konstanz, Konstanz D-78457, Germany
  • V. Shikin Institute of Solid State Physics of the Russian Academy of Sciences Moscow District, Chernogolovka 142432, Russia

DOI:

https://doi.org/10.1063/1.1614175

Ключові слова:

PACS: 67.70. n, 68.15. e, 68.43.-h, 68.55.-a

Анотація

For the thickness of a liquid or solid quantum film, like liquid helium or solid hydrogen, there exist still open questions about how the film thickness develops in certain limits. One of these is the thick film limit, i.e., the crossover from the thick film to bulk. We have performed measurements in this range using the surface plasmon resonance technique and an evaporated Ag film deposited on glass as substrate. The thickness of the adsorbed helium film is varied by changing the distance h of the bulk reservoir to the surface of the substrate. In the limiting case, when h → 0, the film thickness approaches about 100 nm following the van der Waals law in the retarded regime. The film thickness and its dependence on h is precisely determined and theoretically modeled. The equilibrium film thickness behaviour is discussed in detail. The agreement between theory and experiment is very good.

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Опубліковано

2003-09-01

Як цитувати

(1)
Klier, J.; Schletterer, F.; Leiderer, P.; Shikin, V. Equilibrium Helium Film in the Thick Film Limit: Physics in Quantum Crystals. Fiz. Nizk. Temp. 2003, 29, 957-960.

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